EPSRC Reference: |
EP/E502989/1 |
Title: |
Follow On: 3D Lithography |
Principal Investigator: |
Seed, Dr NL |
Other Investigators: |
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Researcher Co-Investigators: |
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Project Partners: |
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Department: |
Electronic and Electrical Engineering |
Organisation: |
University of Sheffield |
Scheme: |
Follow on Fund |
Starts: |
01 June 2007 |
Ends: |
31 August 2008 |
Value (£): |
87,454
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EPSRC Research Topic Classifications: |
Electronic Devices & Subsys. |
Materials Processing |
Microsystems |
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EPSRC Industrial Sector Classifications: |
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Related Grants: |
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Panel History: |
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Summary on Grant Application Form |
In conjunction with collaborators at Durham University we have developed a technique for the realisation of fine pitch photolithography over grossly non-planar substrates. The technique has opened-up the potential for many novel applications within the fields of microelectronics and microsensor packaging. We have demonstrated proof-of-principle, have fled a patent in this area and continue to develop the technique. The intention of this proposal is to refine the technology and produce two demonstrators that can be used to attract commercial partners and investors. One demonstrator will show fine-pitch interconnections between the top and bottom of a silicon wafer and the second will show a 3D-spiral antenna.
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Key Findings |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Potential use in non-academic contexts |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Impacts |
Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
Summary |
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Date Materialised |
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Sectors submitted by the Researcher |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Project URL: |
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Further Information: |
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Organisation Website: |
http://www.shef.ac.uk |