| EPSRC Reference: |
EP/I502017/1 |
| Title: |
Next Generation Resist Technology for the Semiconductor Industry |
| Principal Investigator: |
Robinson, Dr APG |
| Other Investigators: |
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| Researcher Co-Investigators: |
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| Project Partners: |
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| Department: |
Chemical Engineering |
| Organisation: |
University of Birmingham |
| Scheme: |
Follow on Fund |
| Starts: |
08 April 2011 |
Ends: |
07 July 2012 |
Value (£): |
81,510
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| EPSRC Research Topic Classifications: |
| Materials Characterisation |
Materials Synthesis & Growth |
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| EPSRC Industrial Sector Classifications: |
| Communications |
Electronics |
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| Related Grants: |
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| Panel History: |
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Summary on Grant Application Form |
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The push for electronics miniaturisation is as strong as ever. However, the current microchip fabrication method, photolithography (etching lines/wires using optical wavelengths of light), is reaching its limit, and is not sustainable beyond 2016. The leading contender to continue past 2016 is Extreme Ultra Violet lithography (EUVL). However, there is currently no EUVL compatible 'resist material' that meets the industry's performance needs. The 'resist material' in this context, is the material that creates the masks from which the wires are etched. We have developed such a material and are now working with Irresistible Materials to bring our resist to market.
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Key Findings |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Potential use in non-academic contexts |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Impacts |
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| Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
| Summary |
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| Date Materialised |
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Sectors submitted by the Researcher |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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| Project URL: |
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| Further Information: |
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| Organisation Website: |
http://www.bham.ac.uk |