| EPSRC Reference: |
GR/H49252/01 |
| Title: |
ION BEAM ASSISTED GROWTH OF NITRIDES AND OXIDES |
| Principal Investigator: |
Colligon, Professor J |
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| Department: |
Electronic and Electrical Engineering |
| Organisation: |
University of Salford |
| Scheme: |
Standard Research (Pre-FEC) |
| Starts: |
01 March 1992 |
Ends: |
28 February 1995 |
Value (£): |
73,735
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Summary on Grant Application Form |
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To correlate the deposition conditions during film growth concurrent with low energy ion bombardment with the composition, crystalline orientation and micro-structure of some nitrides and oxides. To understand the physical and chemical processes involved in these processes.
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Key Findings |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Potential use in non-academic contexts |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Impacts |
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| Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
| Summary |
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| Date Materialised |
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Sectors submitted by the Researcher |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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| Project URL: |
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| Further Information: |
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| Organisation Website: |
http://www.salford.ac.uk |