| EPSRC Reference: |
GR/J35061/01 |
| Title: |
AQUEOUS-BASE DEVELOPABLE POLYMER RESISTS BASED ON THE CHEMICAL AMPLIFICATION PRINCIPLE |
| Principal Investigator: |
Jones, Professor D |
| Other Investigators: |
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| Project Partners: |
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| Department: |
Sch of Physical Sciences |
| Organisation: |
University of Kent |
| Scheme: |
Standard Research (Pre-FEC) |
| Starts: |
21 June 1994 |
Ends: |
20 September 1997 |
Value (£): |
119,518
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| EPSRC Research Topic Classifications: |
| Materials Synthesis & Growth |
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Summary on Grant Application Form |
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The research programme will prepare resist formulations based on photoacid generators and copolymers containing crosslinkable groups and aqueous-base soluble groups. A range of photoacid generators will be assessed. The copolymers are to be based on novel partial epoxy-modifications of poly(hydroxystyrene). The resist formulations will be fully assessed as both photo- and electron-beam resists. The lithographic assessment will include studies of resist sensitivity, attainable resolution and the dry-etch resistance of the materials.
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Key Findings |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Potential use in non-academic contexts |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Impacts |
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| Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
| Summary |
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| Date Materialised |
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Sectors submitted by the Researcher |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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| Project URL: |
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| Further Information: |
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| Organisation Website: |
http://www.kent.ac.uk |