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Details of Grant 

EPSRC Reference: GR/L24625/01
Title: A HIGH QUALITY SURFACE FINISHING FACILITY
Principal Investigator: Whatmore, Professor RW
Other Investigators:
Nicholls, Professor JR
Researcher Co-Investigators:
Project Partners:
Domino U K Ltd Infrared Integrated Systems Ltd Morgan Matroc
Pre Nexus Migration Xaar Plc
Department: Sch of Engineering
Organisation: Cranfield University
Scheme: JREI
Starts: 27 February 1997 Ends: 26 February 1998 Value (£): 13,515
EPSRC Research Topic Classifications:
Materials Processing
EPSRC Industrial Sector Classifications:
Electronics
Related Grants:
Panel History:  
Summary on Grant Application Form
The research will involve the preparation of ferroelectric ceramic wafers which must be finished to a high standard of flatness and surface quality. These will be used for:1. Studies of the effects of damage in ferroelectrics.2. Fabrication of piezoelectric and pyroelectric devices for microsystems.The research will also involve the preparation of single crystal substrates for ferroelectric thin film growth.In addition the research will involve the preparation of metal and polymeric substrates for depositing nano-dimensional multi-layer coating systems offering improved damage tolerance through superlattice structures. This facility will also support existing EPSRC contracts in the development of multi-component thin film sensors where substrate preparation is a priority.
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Project URL:  
Further Information:  
Organisation Website: http://www.cranfield.ac.uk