EPSRC Reference: |
GR/R57287/01 |
Title: |
Fine Pitch 3-D Photolithography Ffestiniog . |
Principal Investigator: |
Seed, Dr NL |
Other Investigators: |
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Researcher Co-Investigators: |
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Project Partners: |
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Department: |
Electronic and Electrical Engineering |
Organisation: |
University of Sheffield |
Scheme: |
Standard Research (Pre-FEC) |
Starts: |
01 August 2001 |
Ends: |
30 April 2002 |
Value (£): |
45,608
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EPSRC Research Topic Classifications: |
Manufacturing Machine & Plant |
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EPSRC Industrial Sector Classifications: |
Electronics |
Creative Industries |
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Related Grants: |
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Panel History: |
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Summary on Grant Application Form |
The study aims to assess the feasibility of using an electrode-depositable photoresist to pattern fine-pitch electrical connections onto three-dimensional surfaces.The work would involve first optimising the patterning process and then assessing its reliability on large substrates. As a case study we will assess the potential for plating some large (230x18mm) printheads which contain over 3000 piezo-electric actuators, each with a step height of 350um. For a successful process every actuator must be connected, hence the case study will provide a significant test for the technology.We will also investigate the limits of step-height versus resolution and consider some speculative methods for overcoming the Fresnel diffraction limit by the use, for exampl, of phase contrast masks.
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Key Findings |
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Potential use in non-academic contexts |
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Impacts |
Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
Summary |
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Date Materialised |
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Sectors submitted by the Researcher |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Project URL: |
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Further Information: |
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Organisation Website: |
http://www.shef.ac.uk |