| EP/M029425/1 | 'Creating a Stink - Investigating Olfactory Transport Streams' | (C) |
| EP/K016202/1 | Ambient Processing of Polymeric Web: Advanced Diagnostics and Applications | (C) |
| EP/F008848/1 | Microengineering of Quadrupole Mass Spectrometers using RP techniques | (P) |
| EP/E048560/1 | Atomic layer deposition of Hafnium-nitride and Lanthanide nitrides | (C) |
| EP/D068606/1 | Liquid injection ALD of Cp- based precursors for deposition of dielectric materials | (C) |
| EP/C003101/1 | Performance, degradation and defect structure of MOS devices using high-k materials as gate dielectrics | (R) |
| EP/C519795/1 | Selective Laser Melting of high aspect ration 3D Microelectromechanical (MEM) Devices and Components - An Engineering of Functional Materials Proposal | (C) |
| GR/S76632/01 | MOCVD of Lanthanide Oxides and Silicates for Microelectronics Applications | (C) |
| GR/S07995/01 | SF6 Emission Monitoring with Mass Spectrometry | (C) |
| GR/R97092/01 | Carbon Based Electronics: A National Consortium | (C) |
| GR/R17416/01 | Integration of Ill-Nitride Materials With Silicon Microsystems Technologies | (C) |
| GR/M93741/01 | 0.03UM VERTICAL SHALLOW TRENCH CMOS TECHNOLOGY (VST-CMOS) | (C) |
| GR/N19564/01 | DEVELOPMENT AND EXPLOITATION OF A COMMERCIAL PLASMA OXIDATION SYSTEM | (C) |
| GR/M69814/01 | PLASMAQUAD: MICROMACHINED MASS SPECTROMETER FOR PLASMA CHARACTERISATION AND CONTROL | (P) |
| GR/M31279/01 | SILICON MICROENGINEERED PLATFORMS FOR ARRAYED QUADRUPOLE MASS SPECTROMETERS | (P) |
| GR/L28159/01 | RELIABILITY DESIGN FOR ULTRA-SHORT GATE CMOS TECHNOLOGIES | (P) |
| GR/K54755/01 | MICROMACHINED QUADRUPOLE MASS SPECTROMETER | (P) |
| GR/K56834/01 | INVESTIGATION OF THE INTERGRATED DESIGN OF A SMALL ELECTRICAL MACHINE AND POWER ELECTRONIC DRIVE | (C) |
| GR/J77979/01 | CHARACTERISATION OF DIELECTRICS FOR LOW POWER CMOS CIRCUITS AND SINGLE ELECTRON ELECTRONICS | (P) |
| GR/J47323/01 | ELECTRON TRANSPORT IN ADVANCED SILICON STRUCTURES | (C) |
| GR/H65733/01 | DIELECTRICS FOR ADVANCED CMOS GATES | (P) |
| GR/F36682/01 | DIELECTRICS FOR ADVANCED CMOS GATES | (P) |
| GR/F42782/01 | POROUS SILICON (FIPOS)DEVELOPMENT | (C) |
| GR/F35180/01 | MATERIALS PROCESSING FOR ADVANCED SOI SUBSTRATES | (C) |