EPSRC Reference: |
EP/F008961/1 |
Title: |
Quantum etch plasma simulation |
Principal Investigator: |
Tennyson, Professor J |
Other Investigators: |
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Researcher Co-Investigators: |
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Project Partners: |
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Department: |
Physics and Astronomy |
Organisation: |
UCL |
Scheme: |
Follow on Fund |
Starts: |
05 August 2007 |
Ends: |
04 September 2008 |
Value (£): |
93,686
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EPSRC Research Topic Classifications: |
Scattering & Spectroscopy |
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EPSRC Industrial Sector Classifications: |
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Related Grants: |
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Panel History: |
Panel Date | Panel Name | Outcome |
03 Apr 2007
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Follow on Fund 4
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Announced
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Summary on Grant Application Form |
The project will produce a prototype Quantum-Etch system: a plasma etching model based on accurate quantum models. This etching program will allow academic and industrial researchers to pre-test major design changes in etching systems. The consequence will be a major efficiency gain for the semiconductor industry in designing industrial etching chambers allowing for the most suitable designs to be quickly identified and moved on to lab testing. Project outputs will include a Requirements Analysis following customer interviews, Development Roadmap, Prototype Quantum-Etch system and a detailed Business Plan which will be used to raise further finance for development and marketing.
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Key Findings |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Potential use in non-academic contexts |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Impacts |
Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
Summary |
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Date Materialised |
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Sectors submitted by the Researcher |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Project URL: |
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Further Information: |
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Organisation Website: |
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