| EPSRC Reference: |
GR/J47323/01 |
| Title: |
ELECTRON TRANSPORT IN ADVANCED SILICON STRUCTURES |
| Principal Investigator: |
Eccleston, Professor W |
| Other Investigators: |
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| Researcher Co-Investigators: |
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| Project Partners: |
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| Department: |
Electrical Engineering and Electronics |
| Organisation: |
University of Liverpool |
| Scheme: |
Standard Research (Pre-FEC) |
| Starts: |
24 November 1993 |
Ends: |
23 November 1995 |
Value (£): |
32,388
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| EPSRC Research Topic Classifications: |
| Electronic Devices & Subsys. |
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| EPSRC Industrial Sector Classifications: |
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| Related Grants: |
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| Panel History: |
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Summary on Grant Application Form |
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Plasma oxidation provides the only known way of producing a number of devices based on quantum effects. Liverpool is the only place in the world capable of doing it. Oxides will be provided as required by the collaborators.
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Key Findings |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Potential use in non-academic contexts |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Impacts |
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| Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
| Summary |
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| Date Materialised |
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Sectors submitted by the Researcher |
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This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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| Project URL: |
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| Further Information: |
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| Organisation Website: |
http://www.liv.ac.uk |