EPSRC Reference: |
GR/K13837/01 |
Title: |
RELIABILITY AND DESIGN RULES FOR DEEP SUBMICRON AND POWER INTEGRATED CIRCUIT INTERCONNECT TECHNOLOGY |
Principal Investigator: |
O'Neill, Professor A |
Other Investigators: |
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Researcher Co-Investigators: |
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Project Partners: |
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Department: |
Electrical, Electronic & Computer Eng |
Organisation: |
Newcastle University |
Scheme: |
Standard Research (Pre-FEC) |
Starts: |
30 June 1995 |
Ends: |
29 March 1999 |
Value (£): |
136,503
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EPSRC Research Topic Classifications: |
Design & Testing Technology |
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EPSRC Industrial Sector Classifications: |
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Related Grants: |
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Panel History: |
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Summary on Grant Application Form |
Development of interconnect design rules for metallic tracks of line width 1mm to 0.1micron and for vias and contacts; correlation of data from scanning electron microscopy, electrical measurements and computer simulation on electromigration and stressmigration; assessment of the effects of passivation and intermetal dielectric on interconnect technology; investigation of new metallurgy; understanding the mechanisms of damage development; comparisons of dc, ac and interrupted testing.
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Key Findings |
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Potential use in non-academic contexts |
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Impacts |
Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
Summary |
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Date Materialised |
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Sectors submitted by the Researcher |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Project URL: |
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Further Information: |
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Organisation Website: |
http://www.ncl.ac.uk |