EPSRC Reference: |
GR/M69265/01 |
Title: |
PULSED PLASMAS FOR DEPOSITION: FUNDAMENTALS AND APPLICATIONS |
Principal Investigator: |
Bradley, Professor JW |
Other Investigators: |
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Researcher Co-Investigators: |
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Project Partners: |
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Department: |
Physics |
Organisation: |
UMIST |
Scheme: |
Standard Research (Pre-FEC) |
Starts: |
01 October 1999 |
Ends: |
30 September 2002 |
Value (£): |
95,249
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EPSRC Research Topic Classifications: |
Materials Characterisation |
Plasmas - Technological |
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EPSRC Industrial Sector Classifications: |
Manufacturing |
No relevance to Underpinning Sectors |
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Related Grants: |
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Panel History: |
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Summary on Grant Application Form |
In the last few years there has been a big growth in interest in using pulsed magnetron plasmas for the reactive deposition of technologically important thin films, such as oxides and nitrides. However, almost all the research and development work has come from outside the UK. This collaborative project is concerned with bringing a much better understanding of the fundamental processes that occur in pulsed deposition plasmas. Detailed time-resolved and time-averaged measurements of the intrinsic plasma parameters will be related directly to the quality of deposited thin films. The influence of the pulsing frequency (from 1 to 100 kHz) and duty cycle on the modification of the plasma properties adjacent to the substrate and in the bulk will be determined. Both reactive (Ar + 02) and non-reactive pulsed deposition plasmas will be studied. To fully achieve our goals, a research-scale magnetron system incorporating electrical diagnostic tools will be built at UMIST. This will replace the sputtering geometry of the production scale equipment at Salford to allow direct comparison of the results on the two systems. Salford 'in-house' surface analytical techniques will be used to determine coating properties and quality.
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Key Findings |
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Potential use in non-academic contexts |
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Impacts |
Description |
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Summary |
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Date Materialised |
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Sectors submitted by the Researcher |
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Project URL: |
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Further Information: |
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Organisation Website: |
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