EPSRC Reference: |
GR/J42298/01 |
Title: |
THE UNIVERSITY OF SURREY ION BEAM FACILITY FOR MICROELECTRONICS |
Principal Investigator: |
Sealy, Professor B |
Other Investigators: |
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Researcher Co-Investigators: |
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Project Partners: |
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Department: |
Sch of Electronics & Physical Sciences |
Organisation: |
University of Surrey |
Scheme: |
Standard Research (Pre-FEC) |
Starts: |
01 February 1994 |
Ends: |
31 October 1995 |
Value (£): |
2,203,948
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EPSRC Research Topic Classifications: |
Materials Processing |
Optoelect. Devices & Circuits |
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EPSRC Industrial Sector Classifications: |
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Related Grants: |
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Panel History: |
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Summary on Grant Application Form |
There are three major aims which reflect the long term objectives of the Facility.(i) To provide ion implantation, ion beam analysis and other measurement and processing facilities for EPSRC supported users and collaborators.(ii) To develop equipment in order to strengthen and broaden the scope of the work carried out and to improve the quality and efficiency of this work.(iii) To develop expertise and to carry out research in new and continuing areas relevant to microelectronics and optoelectronics.
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Key Findings |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Potential use in non-academic contexts |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Impacts |
Description |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk |
Summary |
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Date Materialised |
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Sectors submitted by the Researcher |
This information can now be found on Gateway to Research (GtR) http://gtr.rcuk.ac.uk
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Project URL: |
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Further Information: |
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Organisation Website: |
http://www.surrey.ac.uk |